SEBALD, Michael. Photolithography at the Limits of Optical Resolution. CHIMIA, [S. l.], v. 47, n. 10, p. 387, 1993. DOI: 10.2533/chimia.1993.387. Disponível em: https://www.chimia.ch/chimia/article/view/1993_387. Acesso em: 25 apr. 2024.