Science Opportunities at the SwissFEL X-ray Laser

Authors

  • Bruce D. Patterson SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Jakub Szlachentko SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Bill Pedrini SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Luc Patthey SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Christopher Milne SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Gerhard Ingold SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Catherine Dejoiea SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland; Laboratorium für Kristallographie ETH Zürich CH-8093 Zürich, Switzerland
  • Hans H. Braun SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Paul Beaud SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland
  • Rafael Abela SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland. rafael.abela@psi.ch

DOI:

https://doi.org/10.2533/chimia.2014.73

Keywords:

Cross correlations, Free electron laser, Photochemistry, Pump and probe experiments, Single shot spectroscopy, X-ray diffraction

Abstract

Next-generation X-ray sources, based on the X-ray Free Electron Laser (XFEL) concept, will provide highly coherent, ultrashort pulses of soft and hard X-rays with peak intensity many orders of magnitude higher than that of a synchrotron. These pulses will allow studies of femtosecond dynamics at nanometer resolution and with chemical selectivity. They will produce diffraction images of organic and inorganic nanostructures without deleterious effects of radiation damage.

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Published

2014-02-26