Crystallographic Services and Technology Support for Industry

Authors

  • Antonia Neels CSEM SA, XRD Application Lab and Microscopy, Microsystems Technology, Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland. antonia.neels@csem.ch
  • Olha Sereda CSEM SA, XRD Application Lab and Microscopy, Microsystems Technology, Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland
  • Tobias Bandi CSEM SA, XRD Application Lab and Microscopy, Microsystems Technology, Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland
  • Xavier Maeder CSEM SA, XRD Application Lab and Microscopy, Microsystems Technology, Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland

DOI:

https://doi.org/10.2533/chimia.2014.14

Keywords:

In situ xrd, Nanoparticles, Strain, Thin films, X-ray diffraction

Abstract

The activities of CSEM's XRD Application Lab are oriented towards the analytical support of technology and product development in the fields of materials sciences, microtechnology, physics, chemistry, nanotechnology and life sciences. Non-destructive X-ray diffraction methods are used for the structural investigation of materials, components and systems. New developments are made with a focus on in situ techniques to 'watch the action' – structural transformations in dependence of applied external fields such as temperature, humidity, magnetic fields or mechanical stresses.
CHIMIA Vol. 68 No. 1-2 (2014): Crystallography, Past, Present, Future

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Published

2014-02-26

Issue

Vol. 68 No. 1-2 (2014): Crystallography, Past, Present, Future

Section

Scientific Articles

License

Copyright (c) 2014 Swiss Chemical Society

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.

How to Cite

[1]
A. Neels, O. Sereda, T. Bandi, X. Maeder, Chimia 2014, 68, 14, DOI: 10.2533/chimia.2014.14.