Verweilzeit in Dünnschichtapparaten
DOI:
https://doi.org/10.2533/chimia.1977.317Abstract
In this work the residence time of a mechanically influenced liquid film in a falling film evaporator has been investigated theoretically. Basing on the assumption that by the rotor blades passages the liquid film is hesitated, one can conceive the vertical fluid dynamic in the film as a instationary process. The mathematical definition leads to a differential equation, which can be solved analytically. The results shows a good accuracy with the experiments at the thin film.
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1977-08-31
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Copyright (c) 1977 B. Covelli

This work is licensed under a Creative Commons Attribution 4.0 International License.
How to Cite
[1]
B. Covelli, F. Widmer, Chimia 1977, 31, 317, DOI: 10.2533/chimia.1977.317.