Verweilzeit in Dünnschichtapparaten

Authors

  • B. Covelli Institut für Verfahrens- und Kältetechnik der ETH Zürich
  • F. Widmer Institut für Verfahrens- und Kältetechnik der ETH Zürich

DOI:

https://doi.org/10.2533/chimia.1977.317

Abstract

In this work the residence time of a mechanically influenced liquid film in a falling film evaporator has been investigated theoretically. Basing on the assumption that by the rotor blades passages the liquid film is hesitated, one can conceive the vertical fluid dynamic in the film as a instationary process. The mathematical definition leads to a differential equation, which can be solved analytically. The results shows a good accuracy with the experiments at the thin film.

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Published

1977-08-31

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